Edwards STP-A1603C Turbo Vacuum Pump - REBUILT
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Edwards Seiko Seiki STP-A1603C Turbomolecular Vacuum Pump - REBUILT
The small and powerful Edwards STP-A1603C turbomolecular pump has been designed using Edwards advanced rotor technology. This provides high throughput, maximum reliability and class leading performance which is demanded by the latest generation of semiconductor processes. Its half rack controller and compact design provide considerable space saving, whilst its advanced deposition reduction system gives improved reliability and performance. The STP-A1603C has been qualified on the latest 200 mm etch tools as well as on new generation 300 mm oxide etch processes.
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|Inlet flange||ISO-200F / VG200 / ICF253|
|Water cooling fitting||PT1/4|
|H2||> 7 x 103|
|Ultimate pressure with bake out heating||10-7 Pa (10-9 Torr)|
|Max allowable backing pressure||266 Pa (2 Torr)|
|Max Nitrogen throughput||2,500 sccm|
|Rated speed||36,500 rpm|
|Starting time||7 min|
|Water cooling flow||2 l/min-1|
|Temperature||5 - 25°C|
|Recommended purge gas flow||20 - 50 sccm|
|Input voltage||200 to 240 (± 10) VAC|
|Power consumption||0.85 kVA|
|Pump weight||35 kg|
|Controller weight||9 kg|
BOC Edwards STP-A1603 Series Instruction Manual
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Edwards Seiko Seiki STP-A1603C Turbomolecular Vacuum Pump - REBUILT YT460Z030 / YT46-0Z-030 STP-A1603C ISO-250F B75100010 / B751-00-010 STP-A1603P ISO-200F B75100100 / B751-00-100 STP-A1603P DN 200 CF PT465Z000 / PT46-5Z-000 STP-A1603P PT465Z100 / PT46-5Z-100 STP-A1603P YT4616004 / YT46-16-004 STP-A1603CV ISO-200F TMS YT4616005 / YT46-16-005 STP-A1603CV DN 200 CF TMS