Edwards STP-XA3203C - NEW
Edwards STP-XA3203C Turbomolecular Vacuum Pump - NEW
The STP-XA3203C turbo pump offers high performance in the process range of high vacuum to 2,300 sccm process flow with enhanced throughput for all gases.
This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition.
The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.
Advanced Rotor Design
- Increased H2, N2 and Ar performance
- Improved performance in the process pressure range of high vacuum to 2,300 sccm
- Maintenance free
5-Axis Magnetic Suspension System
- Zero contamination
- Low vibration
Innovative Torque Management
- Patented torque reduction mechanism
Optimized Temperature Management
- High temperature TMS capability
- Low deposition
- Built-in cooling mechanism
- Higher gas throughput heated and unheated
- Optimized life
- Harsh process compatible
- SEMI® compliant, CE Marked and UL Listed
Questions? Please call our toll free number at 866-332-0500 or send an email to our sales team!
|H2||> 6 x 103|
|Ult. pressure||10-7 Pa|
|Max. allowable backing pressure||266 Pa|
|Max. allowable gas flow|
|N2 (water cooled)||2,300 sccm (3.8 Pam3s-1)|
|Ar (water cooled)||1,900 sccm (3.2 Pam3s-1)|
|Rated speed||27,500 rpm|
|Starting time||< 8 min|
|Temperature||5 - 25°C|
|Recommended purge gas flow||50 sccm|
|Power consumption||1.5 kVA|
|Input voltage||200 to 240 VAC|
|Pump weight||80 kg|
Need modifications to this item? PTB Sales' expert team of engineers can configure products to your specific needs. Please follow the above link, and fill out the quote form.
Edwards STP-XA3203C Turbomolecular Vacuum Pump - NEW P/N YT66-0Z-050 / YT660Z050 STP-XA3203C ISO-320F P/N PT66-0Z-080 / PT660Z080 STP-XA3203C DN 320 CF P/N YT66-0Z-150 / YT660Z150 STP-XA3203C VG-300