Research & Development
PTB Industry Focus: Research & Development
PTB Sales has been supporting Government, Educational and Commercial Research & Development Laboratories and Facilities for approximately two decades with a variety of services across a broad array of equipment.
R&D Facilities use a very wide variety of vacuum equipment in their research and development projects. Often, they require applications and engineering support in order to both select the proper vacuum pump and optimize the performance.
PTB provides New and Rebuilt Equipment Sales and the following services to R&D:
- Repair Services
- Select Consumables
- Logistics & Inventory Services
- Technical Support
- Custom Engineering
We provide this high level of support across the full spectrum of vacuum equipment types and manufacturers and have been doing so for many years:
PTB is perfectly suited to support R&D Facilities as we provide the highest quality services across the widest breadth of vacuum pump types and OEMs in North America. This type of product and service breadth in addition to our engineering and applications support allows us to provide the flexible, knowledge based support that R&D customers need to be successful.
Additionally, PTB provides custom vacuum manufacturing services. This capability allows us to engage with Labs, understand the performance requirements, jointly develop specs and deliver custom vacuum systems that are tailored to the specific research application.
Mass Spectrometry Equipment Spares Supported
- Agilent GC/MSD - 5970, 5971, 5972, 5973, 5975C, 5977A, 5977B, 6890
- Agilent GC/Q-TOF - 7200B, 7250
- Agilent Triple Quadrupole GC/MS - 7000D, 7010B
- Agilent Triple Quad LC/MS - 6420A, 6460, 6490, 6495C, 6470A, Ultivo
- Agilent LC/MSD - iQ, XT
- Agilent LC/Q-TOF - 6530, 6545, 6545XT, 6546, 6560, 6530, 6550
- Agilent LC/MS TOF - 6230B
- BRUKER MALDI-TOF/TOF - rapiflex, microflex, ultrafleXtreme, autoflex maX, spotOn
- BRUKER MALDI Biotyper
- BRUKER ESI-ITMS - amaZon speed, ETD, SL, toxtyper
- BRUKER GC-MS/TQ - EVOQ Elite, Qube
- BRUKER ESI-QTOF - maXis II, impact II, compact, timsTOF
- BRUKER MRMS - scimaX, solariX
- SCIEX LC-MS/MS - API 3000, 4000, 5000
- SCIEX QTOF - X500B, X500R
- SCIEX TripleTOF - 5600+, 6600+
- SCIEX Triple Quad - 3500, 4500, 5500+, 6500+
- SCIEX QTRAP - 3200, 4500, 5500, 6500+
- Shimadzu GC-MS/MS - TQ8040, TQ8050
- Shimadzu GC-MS - QP2010, QP2020
- Shimadzu LC-MS/MS - 8040, 8045, 8050, 8060
- Shimadzu LC-MS - 2020, Nexera
- Shimadzu LC/Q-TOF - 9030
- Thermo Fisher Scientific Orbitrap - Exploris 480, Q Exactive, Tribrid
- Thermo Fisher Scientific Triple Quad TSQ - Fortis, Endura, Quantis, Altis
- Varian Triple Quad LC-MS - 320-MS, 500-MS
- Varian GC-MS - Saturn 2000, 2100, 2200, 1200L, 4000
University Process Equipment Spares Supported
- Branson Resist Strip
- Aura / Glen 1000 Resist Strip
- Unaxis 770 Deep Si Etcher
- PlasmaTherm Deep Si Etcher
- Xactix Xenon Difluoride Etcher
- Veeco Ion Mill
- PT770 Etcher
- PT72 Etcher
- Trion Etcher
- Oxford 100 Etcher
- Oxford 81 Etcher #1
- Oxford 82 Etcher #2
- Oxford ALD FlexAL
- MVD100
- TFT LPCVD LTO410 - A3
- Parylene Deposition
- SC4500 Odd-Hour Evaporator #1
- SC4500 Even-Hour Evaporator #2
- CHA Evaporator
- Eaton Ion Implant
- CVC Sputter Deposition
- PVD75 Sputter Deposition
- LPCVD Nitride - B4
- LPCVD CMOS Nitride - E4
R&D Semiconductor Process Equipment Spares Supported
- Gasonics Asher
- STS ICP SOE Plasma Etchers
- STS PECVD
- Xactix Plasma Etcher
- Plasma Therm ICP RIE Plasma Etcher
- Plasma Therm PECVD
- Plasma Therm RIE, SLR RIE Plasma Etcher
- Trion ICP RIE Plasma Etcher
- Vision RIE 2 Plasma Ecther
- Atomic Layer Deposition Systems
- CVC E-Beam Evaporator
- PVD 75 Filament Evaporator
- PVD 75 RF Sputtering System
- ASTEX ECR PECVD
- Unaxis PECVD
- Earnest Fullam Sputter Coater
- Hummer Sputtering System
- Denton Discovery RF/DC Sputter System
- Unifilm Sputtering System
Nanotechnology System Spares Supported
- Cambridge Nanotech S200 Thin Film Deposition
- Denton Explorer 14
- Lesker Nano 36
- Lesker PVD 75 2
- Lesker PVD 75 3
- Oxford Plasma Lab 100
- Paralyne Deposition System
- Trion Phantom III Reactive Ion Etch (RIE) System
R&D Process Equipment Spares Supported
- Anatech Barrel Asher - RIE 3, RIE 9
- Fishione Specimen Plasma Cleaner
- Samco RIE 4 Plasma Etcher
- Technics RIE 5 Plasma Etcher
- Nexx Systems RIE Plasma Etcher
- Plasma Therm Unaxis ICP RIE 7
- STE RIE ICP 8
- South Bay Tech. RIE 1
- Cambridge Nano Tech ALD 1
- Denton Vacuum E-Beam Evaporator
- Edwards E-Beam Evaporator
- Lesker E-Beam Evaporator
- Sharon Vacuum E-Beam Evaporator
- Key High Vacuum Thermal Evaporator
- Sharon Vacuum Thermal Evaporators
- Nexx Systems PECVD
- Seki Technotron PECVD Diamond
- STS PECVD
- Cressington Specimen Coater
- Fischione 1010 Dual Beam Ion Miller
- Fischione 1040 Nanomill
- Gatan Precision Ion Miller
- AJA International Sputtering System SP 2, SP 3
- Baltec Carbon Coater
- Balzers Freeze Etching System
R&D University Spares
- Branson Asher
- Jelight UV Ozone Cleaner
- Plasma Therm Deep Trench Etcher
- Plasma Therm PE CVD System
- Technics Ion Miller
- Advanced Vacuum Dielectric Etcher
- STS Etcher
- Cambridge Nano Tech ALD System
- CHA Electron Beam Evaporator
- Temescal Electron Beam Evaporator
- Varian Electron Beam Evaporator
- AJA International Sputtering System
- Perkin Elmer DC Sputter System